Equipment

MRC’s 12,000 sq. ft. cleanroom supports advanced micro- and nanofabrication across silicon, III–V, and soft materials. Core capabilities include sub-20 nm electron-beam lithography, alongside deposition, etching, thermal processing, and comprehensive characterization tools.

MRC equipment is located in the North Cleanroom of the Microelectronics and Engineering Research Center (MER) on the J.J. Pickle Research Campus.

Training is required before independent use. Submit a training request for any instruments needed for your work. Once training is complete, instruments can be reserved through the Facility Billing System (FBS).

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Diffusion Pre-clean Hood Acid C-16

Location: MER 1.756
Hood
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Diffusion Pre-clean Hood Acid (Gate) C-11

Location: MER 1.756
Hood
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Acid hood g12

Hood Acid - G12 & G14- Metal Etch (no Au)

Location: MER 1.736
Hood
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Hood Acid - H14 & H15- Resist Removal (no Au)

Location: MER 1.738
Hood
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Hood Acid - WPS - E02

Location: MER 1.748
Hood
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Hood Acid - WPS - J19

Location: MER 1.728
Hood
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Hood KOH - H16 & H18- KoH Etch

Location: MER 1.738
Hood
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Photoresist Spin Coater- Brewer Science

Location: MER 1.72
Hood
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Photoresist Spin Coater J21 - J23

Location: MER 1.738
Hood
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Photoresist Spin Coater - L10 (no Au)

Location: MER 1.72
Hood
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Solvent Hood - E05 Lift off Applications

Location: MER 1.748
Hood
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Solvent Hood - G8 & G11 - Cr/Al Etch

Location: MER 1.736
Hood
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Solvent Hood - H03 (No Au)

Location: MER 1.738
Hood
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Solvent Hood - WPS - F03

Location: MER 1.75
Hood
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Solvent Hood - WPS - F06

Location: MER 1.75
Hood
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Solvent Hood - WPS - J24

Location: MER 1.728
Hood
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Spin Rinse Dryer

Spin Rinse Dryer SAT (No Photoresist, No Metal)

Location: MER 1.756
Hood
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Spin Rinse Dryer Verteq 1 & 2 (No Photoresist, No Metal)

Location: MER 1.756
Hood
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