Equipment

MRC’s 12,000 sq. ft. cleanroom supports advanced micro- and nanofabrication across silicon, III–V, and soft materials. Core capabilities include sub-20 nm electron-beam lithography, alongside deposition, etching, thermal processing, and comprehensive characterization tools.

MRC equipment is located in the North Cleanroom of the Microelectronics and Engineering Research Center (MER) on the J.J. Pickle Research Campus.

Training is required before independent use. Submit a training request for any instruments needed for your work. Once training is complete, instruments can be reserved through the Facility Billing System (FBS).

E-beam writer JEOL 8100

E-beam Writer - JEOL 8100

Location: MER 1.720A
Electron Beam Lithography
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E-line Raith - Electron beam lithography

E-line Raith - Ebeam Lithography

Location: MER 1.730A
Electron Beam Lithography
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Raith 150 tow

Raith 150 Two - Ebeam Lithography

Location: MER 1.720A
Electron Beam Lithography
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