Features:
This EBL tool consists of a load lock, laser-interferometer controlled stage, six aperture selections, and a good quality scanning electron microscopy (SEM) capability. The maximum electron high tension (EHT) is of 30 kV.
Compatible Materials: No Restrictions
Incompatible Materials: Highly degassing material or life sample
Training video: How to do electron beam lithography using E-line Raith
