Photoresist Spin Coater- Brewer Science

Features:

• Spinner and hot plate to apply and cure photoresist
• Wafer Chuck Holders for 3" to 8" and 65 mm x 65 mm quartz template
• Nine (9) pre-programed recipes

Compatible Materials: Si / SiGe / Hi K Layers: Oxides / Nitrides / Top-Electrode Polysilicon, TaN, Al Chemicals: Photoresist / Developer / Acetone / Methanol / IPA

Incompatible Materials: III-V, Liftoff Processes, Corrosive Etching (except developer), Au, Ag, Hg, Cu developer

To Run Program:

1. Set Temperature of Hotplate
2. Wipe down Spinner Chamber with Acetone and Hotplate
   Surface with DI Water
3. Select [RESET] "CEE 100CB AUTO DISP"
4. Select [RUN] (Enter Program Number to be Run)
5. Select [ENTER]
6. Load Wafer on Spinner Chuck
7. Select [START]
8. Adjust Wafer to Center (To Re-Adjust Select 0)
9. Dispense manually Solution to Center of Wafer and Close
   Spinner Lid
10. Select [START]
11. After Complete, Unload Wafer and Move to Hotplate for the
    Specified Time.Close Hotplate Hood during Baking Procedure.
12. Remove Wafer From Hotplate and Allow to Cool

To Edit Program:

1. Select [Program]
2. Enter The Number Your Recipe is to be Stored as
3. Select [ENTER]
4. @ "DISPENSE 1=ON 0=OFF" Select [ 0 ]
5. Select [ENTER]
6. Enter the Velocities, RPM & Time Settings for Each of Your
   Desired Ramps
7. PROGRAM VEL/0 ___RPM
8. Select [ENTER]
9. PROGRAM RMP/0 ___RPM
10. Select [ENTER]
11. PROGRAM TIME/0 ___SEC
12. Select [ENTER]
13. Continue Above Process For the Required Number of Ramps
    Needed for Your Recipe
14. When Finished, (@ Next Sequential Ramp Entry) PROGRAM
    VEL/# END RPM - Select [END]
15. Select [ENTER]