Rapid Thermal Process - AET

Rapid Thermal Process

N2, NO (nitric oxide, nitrogen monoxide), Nitrous oxide-laughing gas (N2O) NH3, O2

Compatible Materials: Si / SiGe / Hi-K (As per label)

Incompatible Materials: Metals (Except Hafnium for Hi-K)

Operation Procedures:

1. Log on the Tool Using the LabAccess Terminal. 
2. Move the mouse to the left of the screen. A menu will appear. 
3. Select "LOGIN/LOGOUT" (username: guest; password: guest)
4. Depress the green "START" button found on the front of the tool.
5. Double click "Open Door" from left menu.
6. Unlatch and open the door after recipe completes.
7. Inspect the TC to make sure it is in the proper position and not broken. Note: TC should be slightly elevated above the wafer holder to insure positive pressure is applied against the back side of your sample/wafer.
8. Close and latch door.
9. Double click "Close Door" from left menu.
10. To Edit/Create a New Recipe:
    1. Select "Recipe Editor" 
    2. Select Current/Default Profile: "utexas.edu_aet" 
    3. Log In - Use above login information
11. Select one of the fallowing:
    1. Create New Recipe.
    2. Open Existing Recipe
    3. Select Recently Opened Recipes
12. Create/Adjust Required Steps and all applicable settings for each step: 
    1. Logger_Sample_Period msec 
    2. Vent 
    3. Temp_Cal_Function 
    4. UHP_N2_Flow_SP_slm 
    5. TEMP_SP
    6. Deg C