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Oxford 80 RIE Etcher

Features:

  • Up to 8" wafers
  • Chamber gases: CH4, N2, H2, Ar, CHF3, Cl2, SF6, Ar
  • Cold chuck (-15°C)
  • Turbo pump

Compatible Materials: Si / SiGe / Polymer

Location
MER 1.75
Category
Etcher RIE Oxford 80