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Photolithography i-g Line Mask Aligner - EVG

Properties: Mask holder 5 inches, Wafer size 2 to 4 inches and pieces. Illumination Wavelength 265nm.

Exposure Modes: soft contact, hard contact, Vaccum contact , Proximity

Compatible Materials: No Restrictions

Operation Procedures:

  1. Log on the system via Lab Access.
  2. Make sure that the power is 500W, the UV light is on.
  3. Start the EV620.exe program.
  4. Log on.
  5. Open recipe 1 (for top alignment) or recipe 2 (for bottom alignment). Check the parameter and run.
  6. Follow the steps by steps procedure given by the software
  7. Exit the program when done. Log off from lab access.
  8. The system should stay on (power, light).
Location
MER 1.728
Category
EVG Mask Aligner