Sub-5nm Multi-field Overlay in Jet and Flash Imprint Lithography
Physical Sciences : Mechanical
Available for non-exclusive licensing
- S.V. Sreenivasan, Ph.D. , Mechanical Engineering
- Paras Ajay , Nascent
- Anshuman Cherala, MSE , Mechanical Engineering
The novelty of jet and flash imprint lithography (J-FIL) was developed to enable patterning of ultra-fine line width circuitry (sub 25nm) without the complications of light-based photolithography which is rapidly approaching its theoretical limitations. One of the drawbacks of J-FIL is lower throughput compared to the mature technology and equipment designs widely utilized in photolithography processes.
Researchers at The University of Texas at Austin, who invented J-FIL technology, have recently developed the process of dual field and quad field overlay that produces line widths of 5nm repeatably and reproducibly with no distortion and no interference with previously patterned fields.
- J-FIL generates accurate replication of very small feature sizes.
- J-FIL is not dependent upon light wavelength limited lithography.
Advanced memory chips and CMOS circuitry.
Proof of concept
- 1 foreign patent application filed
- 1 U.S. patent application filed